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Nano Science Lab Facility

Contact Angle Measuring System

EASYDROP(Kruss)
It is used for the measurement of contact angle between a liquid and a solid. In addition to this, the system also permits the recording and evaluation of video images and the calculation of surface energies and surface tension with the aid of the numerous evaluation methods.

Specifications:

  • Measuring range: 1-180°
  • Accuracy: ± 0.1°
  • Camera: Monochrome interline CCD, 25/30 fps
  • Light Source: Halogen lamp
  • Dimensions: 520*160*530 mm
  • Power supply: 220V, 50 Hz
  • Power Consumption: 30 W

Thermal Annealing

FURNACE (Lenton LTF 16/450)

The lab houses a fully functional tubular furnace for annealing of materials. Heating in the Lenton LTF 16/450 furnace is provided by silicon carbide rod elements which are mounted parallel to the work tube. The elements radiate heat directly onto the tube for rapid response rates. Low thermal mass insulation is used throughout for maximum thermal efficiency and stability. A digital temperature controller is provided which uses PID algorithms to give excellent temperature control. The controller can store up to 5 programs of 8 ramp/dwell segments.

Specifications:

  • Annealing in ambient as well inert environment
  • Maximum operating Temperature: 1400°C
  • Maximum power: 4.5kW

Synthesis Techniques Available 

Hydrogenation System

Electrical Measurement Facility
Here in the Nano Science Laboratory we have the Keithley set-up for the electrical measurements of the Nano-structured thin films. Keithley is an application program designed and developed for characterizing nanoscale materials devices as well as semiconducting devices. Sources and measurement functions for a test are provided by source measure units (electronic instruments that source and measure DC voltages and currents). Test capabilities are extended with support from a variety of external components:

Nanoscience laboratory has a thin film hydrogenation set up for loading/unloading hydrogen in thin films samples. At the top of the sample holder we have used an electrical feed-through for the electrical resistance measurement. The resistance of the films is measured in situ with the help of Keithley electrometer. 

  • Synthesis Techniques Available DC/RF Magnetron Sputtering Units
  • Pulsed DC Sputtering System
  • PLD Technique
  • Spin Coater
  • Thermal Evaporation Unit
  • Hydrogenation System Electrical Measurement Facility

 
Model 2002 Multimeter

  • Make: Keithley

Model 2400 Source meter:

  • Make: Keithley 

2182 A Nanovoltmeter:

The model 2182 can often simplify experiments by coordinating the operation of a current source with nanovoltmeter and by making low noise measurements in a short time.